We report the measurement on the angular distribution of material sputtered from Ge target bombarded with normally incident Ar + and Ne + ions at room temperature. The energy of the ions was varied from 0.6 keV to 4.0 keV. Sputter deposited material was collected on Al foils and subsequently analyzed by an electron probe micro analyzer (EPMA) to obtain the angular distribution. All the results were well-fitted by distributions of the form cos nθ with n varying from 1.25 to 1.63. In the present experiment Ne sputtering of germanium gives rise to strong over-cosine angular distribution of sputtered material in comparison to Ar sputtering.