Preparation of Al <SUB>2</SUB>O <SUB>3</SUB> films by a new CVD process combining plasma and accelerated ion beams

doi:10.1016/0168-583X(95)01428-4

Preparation of Al ₂O ₃ films by a new CVD process combining plasma and accelerated ion beams

We have developed a new p-CVD process which incorporates accelerated ions in order to produce new functional materials which have multiple structures not available when using other processes. Aluminium oxide films deposited on the nickel based superalloy (INCONEL718) by p-CVD combined with simultaneous N ₂⁺ (accelerated to 10 keV) irradiation are polycrystalline and have very smooth surfaces and show superior adhesion compared to conventional plasma CVD layers.

Publication:: Nuclear Instruments and Methods in Physics Research B
Pub Date:: May 1996
DOI:: 10.1016/0168-583X(95)01428-4
Bibcode:: 1996NIMPB.112..280N

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Preparation of Al 2O 3 films by a new CVD process combining plasma and accelerated ion beams

Abstract

Preparation of Al ₂O ₃ films by a new CVD process combining plasma and accelerated ion beams