A Room Temperature Method for the Formation of Ultrathin SiOx Films
Abstract
Precursor polysiloxane thin films have been transformed into SiOx ultrathin films by exposure to UV-ozone at room temperature and atmospheric pressure. Excellent control of film thickness from as low as 15 A has been demonstrated through variable angle spectroscopic ellipsometry. By using the Langmuir- Blodgett molecular assembly technique, the thickness of the precursor films can be controlled precisely through the molecular weight of the oligomers as well as the number of depositions. The mechanism and kinetics of the UV-ozone induced transformation reactions were studied by x-ray photoelectron spectroscopy, grazing incidence infrared spectroscopy, and contact angle analysis. Atomic force microscopy (AFM) has been used to examine the homogeneity of the films. AFM studies have also been used to show the direct patterning of precursor films.
- Publication:
-
APS March Meeting Abstracts
- Pub Date:
- March 1996
- Bibcode:
- 1996APS..MAR.J3229M