Ion induced desorption cross sections for Cu thin films (≤ 1 ML) on Ru(0001) have been measured by bombardment with Ne + ions. The accurate calibration of the Cu coverage was carried out by Auger electron spectroscopy (AES), low energy electron diffraction (LEED) and low energy ion scattering (LEIS). Decreases in surface Cu as a function of ion dose were monitored for various Cu coverages by LEIS measurement. At 1 ML of Cu coverage, the desorption cross section was measured to be σD ∼ 2.03 × 10 -15 ions/cm 2, or a sputtering yield of Y ∼ 3.2 at 1 keV. Application of binary collision sputtering models indicates that for E0 > 400 eV the Cu atoms are mainly removed by sputtered Ru atoms moving outward through the surface region.