Real time in situ monitoring of surfaces during glow discharge processing: NH3 and H2 plasma passivation of GaAs
Abstract
- Publication:
-
Journal of Vacuum Science Technology B: Microelectronics and Nanometer Structures
- Pub Date:
- March 1995
- DOI:
- 10.1116/1.588361
- Bibcode:
- 1995JVSTB..13..258A