Fabrication of controlled slope attenuated phase-shift x-ray masks for 250 nm synchrotron lithography
Abstract
- Publication:
-
Journal of Vacuum Science Technology B: Microelectronics and Nanometer Structures
- Pub Date:
- November 1994
- DOI:
- 10.1116/1.587409
- Bibcode:
- 1994JVSTB..12.3954G