Reactive ion etching of RuO2 thin films using the gas mixture O2/CF3CFH2
Abstract
Not Available
- Publication:
-
Journal of Vacuum Science Technology B: Microelectronics and Nanometer Structures
- Pub Date:
- November 1994
- DOI:
- 10.1116/1.587501
- Bibcode:
- 1994JVSTB..12.3208P