Continuous ultra-dry process for enhancing the reliability of ultrathin silicon oxide films in metal-oxide semiconductors
Abstract
- Publication:
-
Journal of Vacuum Science Technology B: Microelectronics and Nanometer Structures
- Pub Date:
- November 1994
- DOI:
- 10.1116/1.587487
- Bibcode:
- 1994JVSTB..12.3112Y