Simplified ultra-high resolution optic for soft x ray imaging
Abstract
In this report, we outline the design considerations and construction of an EUV reflection imaging microscope. The parameters of the microscope and the debris measurements of the source are presented. The reasons for selecting a laser-produced plasma (LPP) source and a Schwarzschild objective are described. While most research efforts for the development of soft x ray sources such as soft x ray lasers pursue the generation of shorter and shorter wavelengths down to the 'water window,' the EUV and soft x ray spectral regions are also ideal wavelengths for applications in chemistry and biology due to the photon energy being close to the molecular bond energy.
- Publication:
-
Final Report
- Pub Date:
- December 1993
- Bibcode:
- 1993ucf..rept.....S
- Keywords:
-
- Extreme Ultraviolet Radiation;
- Imaging Techniques;
- Microscopes;
- X Ray Analysis;
- X Ray Optics;
- X Rays;
- High Resolution;
- Laser Applications;
- Plasmas (Physics);
- X Ray Inspection;
- Optics