An Approach for Nanolithography Using Electron Holography
Abstract
A technique of electron holography was applied to nanofabrication. Electron interference fringes whose spacing was 108 nm were successfully recorded on polymethylmethacrylate (PMMA) resist using a W< 100> thermal field emission (TFE) gun and an electron biprism both set on a conventional transmission electron microscope (TEM). Furthermore, we have attempted the fabrication of a free-standing multi-biprism by electron beam lithography and dry etching, leading to a new fabrication method of a nanoscale grating with a short exposure.
- Publication:
-
Japanese Journal of Applied Physics
- Pub Date:
- December 1993
- DOI:
- 10.1143/JJAP.32.5988
- Bibcode:
- 1993JaJAP..32.5988O