Experimental investigation of double-pass amplification of an x-ray laser in neonlike germanium
Abstract
Experimental investigations of double-pass amplification of an x-ray laser in Ne-like germanium were carried out at the Shengguang laser facility (of the High Power Laser and Physics Laboratory, Shanghai, China). In these experiments a molybdenum-silicon multilayer mirror was used at normal incidence, and a flat-field grating spectrograph was used to measure the intensities of the laser lines. We observed double-pass emission intensity in Ne-like Ge at 23.2 and 23.6 nm that was five times larger than that of the single-pass amplified spontaneous emission. The damage of the multilayer mirror irradiated by laser plasma was measured simultaneously, the lifetime of Mo-Si multilayer mirror was about 440-700 ps. In addition, we measured the beam divergence of the lasing beam; the results showed that the beam divergence in the vertical direction was about 22 mrad and in the horizontal direction about 12 mrad. Also, the beam optics of the double-pass signal was observed.
- Publication:
-
Physical Review A
- Pub Date:
- August 1992
- DOI:
- 10.1103/PhysRevA.46.1610
- Bibcode:
- 1992PhRvA..46.1610S
- Keywords:
-
- 42.55.Vc;
- 42.60.Da;
- 42.79.-e;
- X- and gamma-ray lasers;
- Resonators cavities amplifiers arrays and rings;
- Optical elements devices and systems