Textured (100) yttria-stabilized zirconia thin films deposited by plasma-enhanced chemical vapor deposition
Abstract
Thin films of yttria-stabilized zirconia were deposited by plasma-enhanced chemical vapor deposition on quartz Si(100), Si(111), Ni, and the steels V2A and hastelloy at substrate temperatures (Ts): 673-873 K. The metal β-diketonates Y(thd)3 and Zr(thd)4 were used as precursors. The fully stabilized fluorite-type cubic structure was obtained over a wide range of yttria contents from 3.5 to 80 mol % (Ts=773 K). The quality of the films depended on the match of the thermal expansion coefficients of substrate and deposit.
- Publication:
-
Applied Physics Letters
- Pub Date:
- July 1991
- DOI:
- 10.1063/1.105439
- Bibcode:
- 1991ApPhL..59..470H
- Keywords:
-
- Crystal Structure;
- Phase Diagrams;
- Thin Films;
- Vapor Deposition;
- Yttrium Oxides;
- Zirconium Oxides;
- Lattice Parameters;
- Phase Transformations;
- Textures;
- X Ray Diffraction;
- Solid-State Physics