Evidence for amorphization in Ni/Ti multilayers from electrical resistivity changes
Abstract
Ni/Ti multilayers of various composition modulation lengths were annealed and studied with in situ electrical resistivity measurements. The resistivity was measured at different temperatures. The temperature coefficient of the resistivity at the annealing temperature was determined as a function of annealing time by correlating temperature and resistivity noise. Specimens were characterized before and after annealing by X-ray diffraction analysis. The temperature coefficient of the resistivity changed sign from positive to negative on annealing, demonstrating that amorphization took place. As a result of amorphization, the resistivity increased on annealing. The kinetics of the resistivity change for small composition modulation lengths indicate that amorphization takes place along the interfaces and along the grain boundaries on the sublayers.
- Publication:
-
Amorphization by Interdiffusion in Metallic Multilayers
- Pub Date:
- 1990
- Bibcode:
- 1990aimm.nasa..161V
- Keywords:
-
- Annealing;
- Electrical Resistivity;
- Metal Crystals;
- Multilayer Insulation;
- Phase Transformations;
- Solid State Physics;
- Grain Boundaries;
- Laminates;
- Nickel;
- Titanium;
- X Ray Diffraction;
- Solid-State Physics