Experimental determination of the proximity effect from 25 to 100 keV in electron beam patterned x-ray masks
Abstract
- Publication:
-
Journal of Vacuum Science Technology B: Microelectronics and Nanometer Structures
- Pub Date:
- November 1990
- DOI:
- 10.1116/1.585126
- Bibcode:
- 1990JVSTB...8.1614U