Erratum: Silicon dioxide fine patterning by reactive fast atom beam etching [J. Vac. Sci. Technol. B 6, 1565 (1988)]
Abstract
- Publication:
-
Journal of Vacuum Science Technology B: Microelectronics and Nanometer Structures
- Pub Date:
- May 1990
- DOI:
- 10.1116/1.585019
- Bibcode:
- 1990JVSTB...8..574K