Epitaxial growth of crystalline, diamond-like films on Si (100) by laser ablation of graphite
Abstract
Pulsed laser evaporation has been used to deposit ultrathin (<1 nm) carbon films on Si (100) in an ultrahigh vacuum environment. Auger spectroscopy studies revealed a layer-by-layer growth up to the fourth layer. Within this coverage range, the electronic structure of the carbon atoms evolves from carbidic to diamond-like. Above two layers the topmost one consists exclusively of carbon atoms as evidenced by low-energy ion scattering experiments. Scanning tunneling microscopy shows that the films are crystalline and that the surface lattice is hexagonal.
- Publication:
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Applied Physics Letters
- Pub Date:
- October 1990
- DOI:
- Bibcode:
- 1990ApPhL..57.1742M
- Keywords:
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- Ablative Materials;
- Crystallinity;
- Laser Beams;
- Vapor Phase Epitaxy;
- Yag Lasers;
- Graphitization;
- Laser Applications;
- Pulse Duration;
- Pulsed Radiation;
- Silicon;
- Solid-State Physics