A scanning photoelectron microscope (SPEM) at the X1A beamline of the National Synchrotron Light Source (NSLS) is being developed and commissioned. It is designed to make use of the Soft X ray Undulator (SXU) at the NSLS. This high brightness source illuminates a Fresnel zone plate, which forms a focused probe, is less than or equal to 0.2 micrometer in size, on the specimen surface. A grating monochromator selects the photon energy in the 400 to 800 eV range with an energy resolution of better than 1 eV. The expected flux in the focus is in the 5 x 10(exp 7) - 10(exp 9) photons/s range. A single pass Cylindrical Mirror Analyzer (CMA) is used to record photoemission spectra, or to form an image within a fixed electron energy bandwidth as the specimen is mechanically scanned. As a first test, a 1000 mesh Au grid was successfully imaged with a resolution of about 1 micrometer and the CMA tuned to the Au 4 f photoelectron peak. Once it is commissioned, a program is planned which will utilize the microscope to study beam sensitive systems, such as thin oxide/sub-oxide films of alumina and silica, and ultimately various adsorbates on these films.
Presented at the 9th International Conference on Vacuum Ultraviolet Radiation Physics
- Pub Date:
- Electron Microscopes;
- Light Sources;
- Photoelectric Emission;
- X Rays;
- Instrumentation and Photography