Based on our experiences with an implanter for metal modification we designed and built a multipurpose implanter for surface modification of polymers, ceramics, and metals. The target chamber has a volume of 2200 1. The vacuum system allows a total pressure of less than 10 -7 mbar. The energy of the implanter is 60 keV (extendable to 160 keV) with ion currents of 0.01-6 mA allowing for implantation doses between 10 12 and 10 18 cm -2 depending on the sample size. The beam is mass analyzed. The mass range for 50 keV ions is 1-180 amu. Since the source has an oven which can reach 1200°C, many elements can be directly evaporated and ionized without the need to use toxic gases. The maximum scan area is 75 × 75 cm 2 and the maximum sample weight 50 kg. Cylindrical samples with a diameter of less than 25 cm may have a length of several meters. Scanning of the samples is performed using an xy-table or a rotational fixture. Water-cooled target holders allow low temperature, high dose implantations of temperature-sensitive targets. As an option, ion beam assisted deposition (IBAD) can be performed using an 8 kW electron gun.