A JEOL 100 CXII converted for use as an electron-beam lithography system
Abstract
- Publication:
-
Journal of Vacuum Science Technology B: Microelectronics and Nanometer Structures
- Pub Date:
- November 1989
- DOI:
- 10.1116/1.584673
- Bibcode:
- 1989JVSTB...7.1823T