Approaches to deep ultraviolet photolithography utilizing acid hardened resin photoresist systems
Abstract
- Publication:
-
Journal of Vacuum Science Technology B: Microelectronics and Nanometer Structures
- Pub Date:
- November 1989
- DOI:
- 10.1116/1.584502
- Bibcode:
- 1989JVSTB...7.1620T