An investigation of the roughening of silicon(100) surfaces in Cl2 reactive ion etching plasmas by in situ ellipsometry and quadrupole mass spectrometry
Abstract
- Publication:
-
Journal of Vacuum Science Technology B: Microelectronics and Nanometer Structures
- Pub Date:
- November 1989
- DOI:
- 10.1116/1.584533
- Bibcode:
- 1989JVSTB...7.1325T