This paper describes some of our recent progress in laboratory research aimed at fabricating multilayers for imaging applications at EUV wavelengths. Some of the equipment available in our laboratory for multilayer research is described and results of some calculations that aided in design of the multilayers and in the selection of materials are discussed. Finally, the results of multilayer deposition on both flat substrates and figured optical surfaces are presented and the visible light test of a system for investigating the normal incidence imaging properties of multilayer optics is described.
Sensing, discrimination, and signal processing and superconducting materials and instrumentation
- Pub Date:
- Extreme Ultraviolet Radiation;
- Imaging Techniques;
- Thin Films;
- Surface Roughness Effects;
- Instrumentation and Photography