Equipment for building and testing superconductive flux flow electronic devices
Abstract
The equipment authorized by the grant is a thin film vacuum deposition system containing provisions for ion beam and magnetron sputter deposition and for ion beam etching.
- Publication:
-
Final Report
- Pub Date:
- November 1987
- Bibcode:
- 1987wisc.rept.....N
- Keywords:
-
- Etching;
- Ion Beams;
- Magnetron Sputtering;
- Thin Films;
- Vacuum Deposition;
- Fabrication;
- Superconductors;
- Electronics and Electrical Engineering