Modeling of latent image formation in electron lithography
Abstract
A model is presented which describes the process of latent image formation in a resist layer during exposure by a focused electron beam. The model is based on a Monte Carlo algorithm for the statistical modeling of electron paths and energy loss calculation. Particular attention is given to the calculation of the dispersed energy density function, which is required both for the modeling of the developing image profiles and for the correction of the proximity effect associated with electron scattering in the resist and the substrate.
 Publication:

Problems of Lithography in Microelectronics
 Pub Date:
 1987
 Bibcode:
 1987plme.book....5V
 Keywords:

 Electron Beams;
 Imaging Techniques;
 Lithography;
 Density Distribution;
 Energy Dissipation;
 Particle Trajectories;
 Statistical Analysis;
 Electronics and Electrical Engineering