Lasing of XeCl, Xe and KrF excimer moleucles in two-comonent mistures

Fast-discharge lasing in dual-component mixtures is achieved in a system with a 30-cm chamber and external cavity. Lasing is obtained on XeCl, XeF, and KrF molecules in mixtures with no buffer gas. The investigation of lasing and dual-component mixtures excited by a fast discharge makes it possible to establish the parameters of the processes which lead to the formation of excimer molecules and to understand better the role of the buffer gas in the active medium of excimer lasers.