Subgap Absorption of Boron-Doped and Undoped a-SiC:H Detected by Photothermal Deflection Spectroscopy
Abstract
Subgap absorption of boron-doped and undoped a-SiC:H alloys is studied by photothermal deflection spectroscopy (PDS). In undoped a-SiC:H, the PDS deduced mid-gap states density Ns shows saturation at 2-5% carbon flow ratio (C2H2/SiH4), while Urbach energy monotonously increases with increasing carbon content. Doping with boron to a-SiC:H also increases Ns and Urbach energy, which tendency is similar to that of a-Si:H. There is no evidence of boron compensating the carbon-induced defects in a-SiC:H. The photoconductivity enhancement of a-SiC:H by doping boron must be attributed to the change of occupation in the gap states.
- Publication:
-
Japanese Journal of Applied Physics
- Pub Date:
- May 1986
- DOI:
- 10.1143/JJAP.25.L388
- Bibcode:
- 1986JaJAP..25L.388A
- Keywords:
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- Absorption Spectroscopy;
- Amorphous Semiconductors;
- Boron;
- Doped Crystals;
- Hydrogenation;
- P-I-N Junctions;
- Silicon Carbides;
- Absorption Spectra;
- Crystal Defects;
- Photoconductivity;
- Solid-State Physics