Demonstration of feasibility of depositing semiconductor layers using microwave enhanced plasma techniques

Manufacturing of low cost more efficient photovoltaic cells partly depends on the development of new process technologies, one of which is the deposition of thin films at relatively low substrate temperatures. Superwave Technology, in an effort to demonstrate the feasibility of microwave enhanced plasma as a means of producing better quality films, has successfully developed a simple but versatile system. The microwave enhanced plasma system developed has the capability of depositing various films of different compositions. This effort was directed towards deposition of silicon nitride film through gas phase plasma reaction.