Contact-resistance process cliff
Abstract
Several approaches were investigated to obtain a measure of the quality of the contact resistance between metal and a diffused or polysilicon layer. These approaches have included the use of both short and very long contact strings as well as arays of contacts with different sizes to determine the contact resistance process cliff. Results from these approaches are discussed.
- Publication:
-
In its Product Assurance Technology for Custom LSI/VLSI Electronics 7 p (SEE N86-29255 20-38
- Pub Date:
- June 1985
- Bibcode:
- 1985patc.nasaQ....P
- Keywords:
-
- Contact Resistance;
- Metals;
- Silicon Polymers;
- Surface Properties;
- Current Density;
- Graphs (Charts);
- Tables (Data);
- Electronics and Electrical Engineering