Surface coatings for radiative cooling applications - Silicon dioxide and silicon nitride made by reactive RF-sputtering
Abstract
Coatings of silicon dioxide and silicon nitride were produced by RF-sputtering of Si in the presence of O2 or N2. The sputter unit, for coating surfaces up to 0.5 x 0.5 sq cm in size, is described. Spectrophotometric data were used to evaluate the complex dielectric function in the range 5-50 microns. The parameters specifying the radiative cooling performance were studied by computation for oxide/nitride bilayers on Al.
- Publication:
-
Solar Energy Materials
- Pub Date:
- November 1985
- Bibcode:
- 1985SoEnM..12..319E
- Keywords:
-
- Coatings;
- Radiant Cooling;
- Silicon Dioxide;
- Silicon Nitrides;
- Sputtering;
- Aluminum;
- Optical Properties;
- Selective Surfaces;
- Spectrophotometry;
- Thin Films;
- Optics