Bias Voltage Dependence of the Detected Voltage in MOM Devices
Abstract
W-Ni point contact MOM devices with stable electrical characteristics are fabricated by using a SiO2 thin film on a nickel post instead of NiO oxide. Two other devices, one made by growing a 10-15 A NiO layer in the air after polishing the Ni surface and the other made by thermally growing a 10-15 A NiO layer, are used to compare the newly developed device characteristics with those of conventional devices. The current-voltage of the fabricated MOM diodes are investigated in order to determine whether the detected voltage arises from nonlinear I-V characteristics. The results are presented in graphs and tables.
- Publication:
-
Japanese Journal of Applied Physics
- Pub Date:
- March 1985
- DOI:
- 10.1143/JJAP.24.375
- Bibcode:
- 1985JaJAP..24..375I
- Keywords:
-
- Bias;
- Electric Potential;
- Mom (Semiconductors);
- Nickel;
- Semiconductor Diodes;
- Silicon Dioxide;
- Tungsten;
- Nickel Oxides;
- Thin Films;
- Volt-Ampere Characteristics;
- Electronics and Electrical Engineering