Efficient computer-aided failure analysis of integrated circuits using scanning electron microscopy
Abstract
A working, operational system for computer-aided failure analysis of integrated circuits using a scanning electron microscope (SEM) is described. Statistical data analysis and image-processing algorithms are applied to digitized SEM image data. Faults are automatically identified and characterized at the single transistor level. Data-storage requirements for locating and characterizing semiconductor device failures are evaluated. A working, operational methods is presented which minimizes these requirements, increases throughput, and permits a high degree of automation.
- Publication:
-
IEEE Transactions on Reliability
- Pub Date:
- December 1985
- Bibcode:
- 1985ITR....34..410P
- Keywords:
-
- Automatic Test Equipment;
- Circuit Reliability;
- Electron Microscopy;
- Electronic Equipment Tests;
- Failure Analysis;
- Integrated Circuits;
- Computer Aided Design;
- Data Storage;
- Electrical Faults;
- Image Analysis;
- Semiconductor Devices;
- Transistors;
- Electronics and Electrical Engineering