Nano-meter bridge with epitaxially deposited NbN on MgO film
Abstract
Nanometer-thickness bridges have been produced through the RF reactive sputtering of NbN films. Those NbN films epitaxially deposited on RF-sputtered MgO films have a high superconducting transition temperature T(c). The T(c) value for the case of a 5-nm thickness film was about 14 K, which is noted to be much higher than values for those deposited on Al2O3 films or Si substrates. Two types of nm-thickness bridges have been reproducibly fabricated with epitaxial NbN-film deposition on MgO. Both ac and dc quantum effects were observed in dc SQUIDS over the 4.2-11.4 K temperature range.
- Publication:
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IEEE Transactions on Magnetics
- Pub Date:
- March 1985
- DOI:
- Bibcode:
- 1985ITM....21..932Y
- Keywords:
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- Electric Bridges;
- Film Thickness;
- Oxide Films;
- Squid (Detectors);
- Thin Films;
- Dimensional Measurement;
- Epitaxy;
- Josephson Junctions;
- Magnesium Oxides;
- Niobium Compounds;
- Nitrides;
- Sputtering;
- Superconductors;
- Transition Temperature;
- Vacuum Deposition;
- Volt-Ampere Characteristics;
- Electronics and Electrical Engineering