A novel GaAs Schottky-drain power FET for microwave application
Abstract
A GaAs Schottky-drain power FET (SDFET) having a 2.4-mm gate periphery and 1.5-micron gate length has been developed, and is shown to realize excellent performance at 10 GHz. An output power in excess of 1 W, and a 36-percent power-added efficiency (PAE) are demonstrated. These devices were fabricated on epitaxial layers grown on 2-micron-thick buffer layers using vapor-phase epitaxy. With the exception of the mesa and recess channels, which were defined by conventional chemical etch, the devices were processed by the plasma dry-etch technique. For the Schottky junctions and source ohmic contacts, tantalum with a thick gold overlayer and GeAu, were used, respectively.
- Publication:
-
IEEE Transactions on Electron Devices
- Pub Date:
- December 1985
- DOI:
- Bibcode:
- 1985ITED...32.2844C
- Keywords:
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- Electric Contacts;
- Field Effect Transistors;
- Gallium Arsenides;
- Microelectronics;
- Microwave Equipment;
- Schottky Diodes;
- Electrical Resistivity;
- Gates (Circuits);
- Gold Coatings;
- Plasma Etching;
- Power Efficiency;
- Refractory Metals;
- Vapor Phase Epitaxy;
- Volt-Ampere Characteristics;
- Electronics and Electrical Engineering