Layered and homogeneous films of aluminum and aluminum/silicon with titanium and tungsten for multilevel interconnects
Abstract
- Publication:
-
IEEE Transactions on Electron Devices
- Pub Date:
- February 1985
- DOI:
- Bibcode:
- 1985ITED...32..174G
- Keywords:
-
- Metal Films;
- Mis (Semiconductors);
- Semiconductors (Materials);
- Silicon Alloys;
- Thin Films;
- Very Large Scale Integration;
- Aluminum;
- Annealing;
- Layers;
- Microstructure;
- Phase Diagrams;
- Sputtering;
- Surface Properties;
- Titanium;
- Tungsten;
- X Ray Diffraction;
- Electronics and Electrical Engineering