Limiting processes laser CVD
Abstract
Preliminary experimental and theoretical research was conducted with the ultimate objective of developing an understanding of the laser chemical vapor deposition (LCVD) process sufficient to predict deposition rates, microstructure, and resulting film properties. SiC deposited on quartz by thermal decomposition of dichloromethylsilane was chosen as the model system. Film thickness profiles, composition, microstructures and film adherence were analyzed. Theoretical support including a preliminary analysis of convective and diffusive transport processes and a finite difference numerical analysis of the laser-generated surface temperature in the substrate were initiated.
- Publication:
-
California Univ., Los Angeles Report
- Pub Date:
- February 1984
- Bibcode:
- 1984ucla.reptR....A
- Keywords:
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- Finite Difference Theory;
- Laser Heating;
- Lasers;
- Quartz;
- Silicon Carbides;
- Vapor Deposition;
- Chemical Composition;
- Film Thickness;
- Microstructure;
- Substrates;
- Lasers and Masers