Sputtering in thin film technology for optics
Abstract
Cosputtering of thin films for optics RF-diode sources; trimming the thickness of optical films by sputter etching; RF sputtering of oxides for IR applications; and deposition of optical films by ion beam sputtering are discussed. Cosputtering enables deposition with a high degree of controllability and reproducibility of films with predetermined refractive indices with value between the two initial bulk materials. Depositing by sputtering films of Y2O3, TiO2HfO2, CeO2 and SiO2 for applications in the IR field yields films with high stability and resistance to surrounding stresses. The refractive index, adsorption, and radiation damage threshold for pulsed and CW lasers (1.06 and 10.6 microns) are reported.
- Publication:
-
In its Rivista Tec. Selenia
- Pub Date:
- 1984
- Bibcode:
- 1984rits....9...19M
- Keywords:
-
- Laser Applications;
- Sputtering;
- Thin Films;
- Infrared Radiation;
- Ion Beams;
- Radiation Damage;
- Radio Frequency Discharge;
- Communications and Radar