Method for making Josephson junctions with contamination-free interfaces utilizing a ZNO contact insulator
Abstract
A method of fabricating Josephson junction integrated circuits in which the active layers are deposited within an ultra-high vacuum system during a single pumpdown of the system. Subsequent anisotropic etching defines the devices by etching away complete layers in some areas so as to isolate the Josephson junction device.
- Publication:
-
Patent Department of the Navy
- Pub Date:
- March 1984
- Bibcode:
- 1984navy.reptR....C
- Keywords:
-
- Etching;
- Fabrication;
- Integrated Circuits;
- Josephson Junctions;
- Ultrahigh Vacuum;
- Vacuum Deposition;
- Anisotropy;
- Impurities;
- Insulators;
- Interfaces;
- Patents;
- Procedures;
- Superconductors;
- Electronics and Electrical Engineering