An extension of the ideal diode analysis for the heavily doped p- n diode
Abstract
In this paper, an extension of the ideal-diode analysis for the heavily-doped p- n junction diode is proposed. The heavy doping effects such as carrier degeneracy and band gap narrowing are accounted for by using a tractable empirical approximation for the reduced Fermi-energy given by[12] and employing effective intrinsic density. Under the assumption of low-level injection, it is found that the injected minority-carrier current, and the charge storage in the quasi-neutral regions should depend exponentially on values of F( Y), where F( Y) is a function of dopant dentisy at the depletion edge of the quasi-neutral emitter (or) base region of the p- n junction. Results of our calculations of excess hole current for the short base and the long-base diode show significant change from the values predictged by the conventional diode theory.
- Publication:
-
Solid State Electronics
- Pub Date:
- June 1984
- DOI:
- 10.1016/0038-1101(84)90191-6
- Bibcode:
- 1984SSEle..27..595T
- Keywords:
-
- Carrier Density (Solid State);
- Doped Crystals;
- Junction Diodes;
- P-N Junctions;
- Volt-Ampere Characteristics;
- Carrier Injection;
- Current Density;
- Density Distribution;
- Design Analysis;
- Minority Carriers;
- Electronics and Electrical Engineering