Laser assisted deposition, etching, and doping; Proceedings of the Meeting, Los Angeles, CA, January 26, 27, 1984

The use of lasers in the deposition, etching, alloying, and doping of thin films and bulk materials is examined in reviews and reports of experimental investigations. Topics discussed include surface and gas processes in photodeposition in small zones, thin-film deposition by UV-laser photolysis, UV-induced photodeposition of Fe films from iron carbonyl, wafer-scale laser pantography in the fabrication of VLSI gate arrays, large-area deposition of hydrogenated a-Si by CW CO2 lasers, electron-beam assisted CVD of SiO2 and Si3N4 films, and laser-induced surface modification of nonferrous alloys. Consideration is given to photochemical CVD for VLSI fabrication, laser-assisted chemical etching, UV-laser-induced radical etching for microelectronic processing, laser-assisted dry etching of semiconducting materials, and laser-induced etcing of insulators using a dc glow discharge in silane.