Implantation parameters of low energy nitrogen in copper
Abstract
Nitrogen atoms were off-axis implanted into Cu(100) and Cu(111) single crystals with energies between 0.25 and 2.5 keV. The implantation profiles were determined by means of Auger electron spectroscopy combined with argon sputter depth profiling. The experimental values for the projected ranges and straggling were compared to various theoretical predictions. The considerable discrepancy between theory and experiment is attributed chiefly to inaccuracies in the theories in the low energy region.
- Publication:
-
Nuclear Instruments and Methods in Physics Research B
- Pub Date:
- March 1984
- DOI:
- 10.1016/0168-583X(84)90313-6
- Bibcode:
- 1984NIMPB...2..774M