Influence of as-deposited film structure on <100> texture in laser-recrystallized silicon on fused quartz

A strong <100> texture has been achieved in cw neodymium:yttrium aluminum garnet laser recrystallization of the 700 °C low pressure chemical vapor deposited (LPCVD) polycrystalline silicon films which exhibit <100> preferred orientation. When <110> texture is dominant in as-deposited films, the <100> texture is not so strong as in the 700 °C LPCVD films. The dependence of the <100> texture on as-deposited film structure implies that the <100> grain growth occurs under such a melting condition as the initial film structure is partially maintained.