Vacuum technology, thin films, and sputtering: An introduction
Abstract
The technology of vacuum evaporation processes is presented in an introductory text, with a focus on vacuum sputtering of thin films. Chapters are devoted to evaporation; vacuum chambers, pumps, traps, and instruments; vacuum evaporation (vapor pressure, evaporation temperature and pressure, electron-beam sources, evaporation of alloys and compounds, film-thickness measurement and control, and substrate cleaning); sputtering (ion bombardment, glow discharge, the Langmuir probe, triode sputtering, RF sputtering, and ion plating); and thin films. A number of specific applications are described in detail, and drawings and diagrams are provided.
- Publication:
-
Orlando
- Pub Date:
- 1983
- Bibcode:
- 1983ofap.book.....S
- Keywords:
-
- Sputtering;
- Thin Films;
- Vacuum Deposition;
- Alloys;
- Diamagnetism;
- Diffusion Pumps;
- Electrostatic Probes;
- Evaporation;
- Film Thickness;
- Glow Discharges;
- Ion Plating;
- Ion Pumps;
- Ion Sources;
- Ionization Gages;
- Maintenance;
- Photolithography;
- Radio Frequencies;
- Superconductivity;
- Systems Engineering;
- Technology Utilization;
- Vacuum Chambers;
- Vacuum Pumps;
- Vapor Pressure;
- Engineering (General)