Electron beam technology for highly integrated circuits
Abstract
Planning and installation of electron beam technology for mask writing is described. Selection of the system; layout of rooms; installations; and test facilities are described. Proven technologies for COP- and PBS-resists are given. Plasma etching is discussed. Information is given on the analysis and application of electron beam resists.
- Publication:
-
Final Report
- Pub Date:
- May 1983
- Bibcode:
- 1983aegt.rept.....H
- Keywords:
-
- Electron Beams;
- Integrated Circuits;
- Masking;
- Plasma Etching;
- Silicones;
- Large Scale Integration;
- Lithography;
- X Rays;
- Electronics and Electrical Engineering