Preparation and characterization of iron oxide thin film electrodes
Abstract
The results of attempts to manufacture thin films of alpha-Fe2O3 on metal substrates by spray pyrolysis and CVD methods for use in photoelectrochemical applications are reported. The films were examined by means of X ray diffraction and scanning electron microscopy. The effects of the substrate temperature and crystallinity and the flow rate, and the gas composition during manufacturing were considered. The parameters examined included the absorptance spectra, the photocurrent magnitude, and the photoelectrochemical properties. Satisfactory adherence on various substrates was displayed by both films, but the electrochemical properties of films prepared by spray pyrolysis were not good. Amorphous films were formed at low temperatures and had band gaps of 1.9 eV when made with the CVD process.
- Publication:
-
Solar Energy Materials
- Pub Date:
- April 1983
- Bibcode:
- 1983SoEnM...8..457S
- Keywords:
-
- Energy Absorption Films;
- Iron Oxides;
- Photoelectrochemical Devices;
- Semiconducting Films;
- Solar Cells;
- Solid Electrodes;
- Thin Films;
- Vapor Deposition;
- Amorphous Semiconductors;
- Crystallinity;
- Energy Gaps (Solid State);
- Metal Oxide Semiconductors;
- Photoelectric Emission;
- Pyrolysis;
- Temperature Effects;
- Volt-Ampere Characteristics;
- Electronics and Electrical Engineering