Characteristics of TaSi2 / Poly - Si Films Oxidized in Steam for VLSI Applications
Abstract
- Publication:
-
Journal of the Electrochemical Society
- Pub Date:
- December 1983
- DOI:
- Bibcode:
- 1983JElS..130.2478D
- Keywords:
-
- Disilicides;
- Oxidation;
- Reaction Kinetics;
- Silicon Films;
- Tantalum Compounds;
- Very Large Scale Integration;
- Network Synthesis;
- Polycrystals;
- Steam;
- Electronics and Electrical Engineering