GaAs microwave devices and circuits with submicron electron-beam defined features
Abstract
This paper describes the fabrication and application of GaAs FET's, both as discrete microwave devices and as the key active components in monolithic microwave integrated circuits. The performance of these devices and circuits is discussed for frequencies ranging from 3 to 25 GHz. The crucial fabrication step is the formation of the submicron gate by electron-beam lithography.
- Publication:
-
IEEE Proceedings
- Pub Date:
- May 1983
- Bibcode:
- 1983IEEEP..71..667W
- Keywords:
-
- Fabrication;
- Field Effect Transistors;
- Gallium Arsenides;
- Integrated Circuits;
- Lithography;
- Microwave Circuits;
- Avalanche Diodes;
- Bipolar Transistors;
- Electron Beams;
- Gunn Diodes;
- Low Noise;
- Metallizing;
- Packing Density;
- Schottky Diodes;
- Technology Assessment;
- Electronics and Electrical Engineering