Energetic distributions of interface states Dit(phi sub s) of MOS transistors in extension of Kuhn's quasistatic C(V)-method
Abstract
Kuhn's quasi-static C(V)-method has been extended to MOS transistors by considering the capacitances of the source and drain p-n junctions additionally to the MOS varactor circuit model. The width of the space charge layers w(phi sub s) is calculated as a function of the surface potential phi sub s and applied to the MOS capacitance as a function of the gate voltage. Capacitance behavior for different channel length is presented as a model and compared to measurement results and evaluations of energetic distributions of interface states Dit(phi sub s) for MOS transistor and MOS varactor on the same chip.
- Publication:
-
Archiv Elektronik und Uebertragungstechnik
- Pub Date:
- October 1983
- Bibcode:
- 1983ArElU..37..293K
- Keywords:
-
- Energy Distribution;
- Metal Oxide Semiconductors;
- Solid State Physics;
- Transistor Circuits;
- Additives;
- Capacitance;
- Chips (Electronics);
- Electric Potential;
- Gates (Circuits);
- Electronics and Electrical Engineering