Wafer-scale laser lithography. I: Pyrolytic deposition of metal microstructures

Mechanisms for laser driven pyrolytic deposition of micronscale metal structures on crystalline silicon were studied. Models were developed to predict temporal and spatial properties of laser induced pyrolytic deposition processes. An argon ion laser based apparatus was used to deposit metal by pyrolytic decomposition of metal alkyl and carbonyl compounds to evaluate the models. Implications for the high speed creation of micronscale metal structures in ultralarge scale integrated circuit systems are discussed.