Development of an electrophoretic image display

The purpose of this work is to develop an X-Y addressed electrophoretic image display (EPID). The problem of indium oxide redeposit onto the walls of the potential wells during ion-beam milling has been solved. A thin layer of SiOx is evaporated over the row-patterned substrate prior to the application of the mylar dielectric. This layer shields the indium oxide during the ion-beam milling process and is subsequently removed by plasma etching. A sample cell for evaluation by ISI was delivered in January. It is anticipated that the yield of mylar EPID cells will be much higher than that in the past due to the SiOx treatment. A number of cells were fabricated using the photopolymer, technology; the cells performed satisfactorily. Bubbles in the suspension, however, have been a problem with these cells. Several causes are being investigated; the evolution of nitrogen gas and poor sealing may be the major contributing causes. Solutions to these problems are being investigated. Work on fixturing and testing procedures for the Phase II cells has begun.