Semiconductor measurement technology: Interlaboratory study on linewidth measurements for antireflective chromium photomasks
Abstract
The results of an interlaboratory study to evaluate a National Bureau of Standards (NBS) prototype calibration standard for linewidth measurements on IC photomasks and procedures for adjusting and calibrating optical-microscope systems in the 0.5 to 12 micrometer measurement range. Using procedures furnished by NBS, industrial participants measured line spacings and linewidths on NBS antireflective-chromium artifacts.
- Publication:
-
NASA STI/Recon Technical Report N
- Pub Date:
- October 1982
- Bibcode:
- 1982STIN...8331007J
- Keywords:
-
- Error Functions;
- Integrated Circuits;
- Linearity;
- Micrometers;
- Photomasks;
- Semiconductor Devices;
- Technology Assessment;
- Dimensional Measurement;
- Least Squares Method;
- Quality Control;
- Standard Deviation;
- Statistical Analysis;
- Instrumentation and Photography